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The 200 mm SEQUEL Express system is the latest evolution of the production-proven SEQUEL system. It offers a low risk manufacturing solution, superior film quality, technology extendibility below 90 nm and high productivity, with minimal non-value added time.
Designed to provide capability for low-k films, the SEQUEL Express deposition system leverages the production-proven MSSD architecture to deliver superior film reproducibility. This superior repeatability translates into improved device performance and increased yield of higher priced devices, enabling our customers’ to maximize their margins. SEQUEL Express further maximizes our customers’ profitability by delivering the highest productivity in several key metrics. It delivers up to 40 percent higher capital productivity, up to 100 percent higher footprint productivity (throughput per square foot of fab space), and up to 40 percent lower CoO than competing CVD tools.
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