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View: 2009 | 2010 Press Releases

   Current Topics (2011)

NOVELLUS INTRODUCES CERAMIC HARD MASK MATERIALS FOR USE IN SUB-22NM BACK-END-OF-LINE PATTERNING
Nov 9, 2011

NOVELLUS INTRODUCES FAMILY OF CONFORMAL FILMS FOR SUB-2X NM LOGIC AND MEMORY APPLICATIONS
Jul 11, 2011

NOVELLUS INTRODUCES ALTUS^® MAX EXTREMEFILL™ TUNGSTEN CVD
Jul 11, 2011
NOVELLUS SHIPS 100TH VECTOR EXTREME SYSTEM
Jul 7, 2011

NOVELLUS SHIPS VECTOR^® LED SYSTEM TO CHINA SEMILEDS
Jun 30, 2011

NOVELLUS' PETER WOLTERS SUBSIDIARY INTRODUCES INNOVATIVE GAP MEASUREMENT TECHNOLOGY FOR DOUBLE-SIDE WAFER POLISHING
May 9, 2011

Vector Excel - A Modular Platform for Advanced Dielectrics that require Pre- and Post-Processing 

Mar 14, 2011

AC-2100L MICROLINE^® DOUBLE SIDE LAPPING SYSTEM
Feb 23, 2011

Vector Extreme TEOS xT- The Fastest PECVD Tool in the Semiconductor Industry
Jan 25, 2011 

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